{
  "title": "How to Make ITO Sputtering Target",
  "kind": "reference",
  "company": "GRISH / Beijing Grish Hitech",
  "category": "Lapping, honing & superfinishing",
  "parameters": {
    "Brand / publisher": "GRISH",
    "Content type": "articles",
    "Language": "English"
  },
  "language": "en",
  "source_url": "https://grish.com/how-to-make-ito-sputtering-target/",
  "content_html": "<h2>There are four main forming methods for ITO targets</h2>\n\n\n\n<h3>Vacuum hot pressing</h3>\n\n\n\n<p>The process of Vacuum Hot Pressing is used to densify ceramic materials by utilizing thermal and mechanical energy, resulting in high-density ITO ceramic targets with densities ranging from 91% to 96%. The process involves heating a mold, adding samples and setting the mold on a heating plate, while controlling the melting temperature and time. The samples are melted, hardened, cooled and finally the finished product can be taken out.</p>\n\n\n\n<h3>Hot isostatic pressing (HIP)</h3>\n\n\n\n<p>Hot isostatic pressing (HIP) is an alternative to pressureless sintering that requires a lower sintering temperature (generally 0.5 to 0.7 times the melting point of the material) and achieves complete densification. This technique is beneficial for controlling structure, inhibiting grain growth, and obtaining a uniform, isotropic structure. When preparing ITO targets by hot isostatic pressing, the ITO solid solution powder must first be reduced in a reducing atmosphere (such as a mixture of H2, N2 and H2) at a temperature of 300 to 500℃. The reduced powder is then processed by molding or cold isostatic pressing to obtain a preform, placed in a stainless steel container with insulating material between them, and vacuum sealed. The sealed container is then placed in a hot isostatic pressing furnace, where it is heated at 800 to 1050℃ at 50 to 200MPa for 2 to 6 hours to prepare the ITO target material.</p>\n\n\n\n<h3>Normal temperature sintering</h3>\n\n\n\n<p>Normal temperature sintering is a target preparation method that was developed in the early 1990s. This method involves mixing In2O3 powder (with a certain tap density) and SnO2 powder to prepare a slurry for mud casting, followed by long-term dehydration and degreasing treatment at 300 to 500°C. The preform is then sintered in a pure oxygen or air atmosphere, at a pressure above 1 atmosphere and a sintering temperature of 1450 to 1550 °C.</p>\n\n\n\n<h3>Cold isostatic pressing</h3>\n\n\n\n<p>Cold isostatic pressing (CIP) is a process that utilizes rubber or plastic as a covering mold material at normal temperature, with a pressure medium of liquid transmitting ultra-high pressure. The ITO powder is then pressed into a large ceramic preform under a low-pressure oxygen atmosphere, and sintered in a pure oxygen environment of 0.1 to 0.9 MPa at a temperature of 1500 to 1600°C. This method can theoretically produce a ceramic target with a density of 95%.</p>\n\n\n\n<h2>Pros and Cons of Each Method</h2>\n\n\n\n<h3>Hot pressing</h3>\n\n\n\n<p>The hot pressing method is a process in which pressing molding and thermal sintering are performed simultaneously . The advantages of this process are:</p>\n\n\n\n<p>(1) During the hot pressing process, since the powder is in a thermoplastic state, the deformation resistance is small, and plastic flow and densification are easy, so the required molding pressure is small.</p>\n\n\n\n<p>(2) Simultaneous heating and pressure are beneficial to the contact, diffusion and flow between powder particles, lowering the sintering temperature and shortens the sintering time, and inhibits grain growth.</p>\n\n\n\n<p>(3) The hot pressing method makes it easy to obtain a sintered body with a density close to the theoretical density and a porosity close to zero, and a fine-grained structure is easily obtained.</p>\n\n\n\n<p>The main disadvantages of this approach are :</p>\n\n\n\n<p>(1) Due to the limitations of hot pressing equipment and mold size, the obtained target size is small. The current maximum target size is 400×300mm.</p>\n\n\n\n<p>(2) This method has high requirements for mold materials (generally high-purity and high-strength graphite). Moreover, hot pressing equipment needs to be imported, which is not suitable for industrial continuous production. The production efficiency is low and the cost is high.</p>\n\n\n\n<p>(3) The uniformity of target grains is poor.</p>\n\n\n\n<h3>Hot isostatic pressing</h3>\n\n\n\n<p>Hot isostatic pressing is the most commonly used method to prepare ITO sputtering targets. It has the following advantages:</p>\n\n\n\n<p>(1) It can overcome the shortcomings of hot pressing in graphite molds.</p>\n\n\n\n<p>(2) Under heating and pressurization, the product is pressurized in all directions at the same time, so that the resulting product has a very high density (close to the theoretical density).</p>\n\n\n\n<p>(3) Hot isostatic pressing combines the pressing and sintering process and reduces the sintering temperature, resulting in improved physical and mechanical properties of the product, while avoiding grain growth.</p>\n\n\n\n<p>The main disadvantages of this approach are :</p>\n\n\n\n<p>(1) The target size is limited by the equipment pressure and cylinder size, making it difficult to prepare large-size targets.</p>\n\n\n\n<p>(2) The equipment is expensive and the investment cost is high.</p>\n\n\n\n<p>(3) Low production efficiency and high production costs make products uncompetitive.</p>\n\n\n\n<h3>Normal temperature sintering</h3>\n\n\n\n<p>The main advantages of the normal temperature sintering method are :</p>\n\n\n\n<p>(1) The size of the target material is not limited by the equipment, and large-size targets can be produced.</p>\n\n\n\n<p>(2) Low equipment investment, low production cost, high production efficiency, excellent target performance, and easy industrial production.</p>\n\n\n\n<p>(3) This method is suitable for the performance requirements of high-end display coating targets.</p>\n\n\n\n<p>Its disadvantages are :</p>\n\n\n\n<p>(1) This sintering method is the most complex compared to other methods, as it requires the addition of sintering aids in order to achieve a dense sintered body. Unfortunately, these sintering aids are difficult to remove from the sintered body, resulting in a reduction in product purity.</p>\n\n\n\n<p>(2) Meeting the strict requirements for shape, particle size and particle size distribution of the powder generally requires ball milling, airflow milling and sedimentation classification of the powder.</p>\n\n\n\n<p>(3) The targets produced are generally thin.</p>\n\n\n\n<h3>Cold isostatic pressing</h3>\n\n\n\n<p>The advantages of preparing ITO targets by cold isostatic pressing are:</p>\n\n\n\n<p>(1) Compared with mechanical pressing, cold isostatic pressing has a large pressure and the workpiece is evenly stressed, making it especially suitable for pressing large-sized powder products.</p>\n\n\n\n<p>(2) Pressed powder products have the advantages of high density and uniformity.</p>\n\n\n\n<p>(3) Pressed powder does not require adding lubricant, etc.</p>\n\n\n\n<p>(4) The production cost is low and suitable for mass production. However, the use of hyperbaric oxygen makes the process dangerous.</p>\n",
  "summary": "The process of Vacuum Hot Pressing is used to densify ceramic materials by utilizing thermal and mechanical energy, resulting in high-density ITO ceramic targets with densities ranging from 91% to 96%. The process involves heating a mold, adding samples and setting the mold on a heating plate, while controlling the melting temperature and time.",
  "sections": [],
  "updated_at": "2026-10-16"
}