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POLISHX/PRODUCT USE INSTRUCTIONS · PG - Water-Free Colloidal Silica v1.1 · 95576d
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PRODUCT USE INSTRUCTIONS · PG - Water-Free Colloidal Silica v1.1 · 95576d

PRODUCT USE INSTRUCTIONSOpen original PDFAlso listed as: Colloidal Silica - Water-Free Applications NoteFull searchable text · 1 pagesRefer to the original PDF for tables, figures and page layout.Page 1 Product Guide www.alliedhightech.com Allied High Tech Products, Inc. Call for more information: 800.675.1118 0.05 µm Water-Free Colloidal Silica Date: 07/2021, v1.1 Refer to the SDS document for additional safety information. Water-free colloidal silica (#180-22010) is ideal as a final polishing…

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Manufacturer / publisherAllied High Tech Products
LanguageEnglish
Captured2026-10-17
Document typeguides
PDF pages1
CategoryCompounds & slurries
Updated2026-10-17T20:52:43.954326+00:00
Allied High Tech published content
Source: https://www.alliedhightech.com/Media/Default/images/PG%20-%20Water-Free%20Colloidal%20Silica%20v1.1.pdf. Manufacturer claims and terminology are reproduced as source material.Explore Product guides & preparation notes ↗

PRODUCT USE INSTRUCTIONS

Open original PDF

Also listed as: Colloidal Silica - Water-Free Applications Note

Full searchable text · 1 pages

Refer to the original PDF for tables, figures and page layout.

Page 1
 
 
Product Guide 
www.alliedhightech.com 
Allied High Tech Products, Inc. 
Call for more information: 800.675.1118 
0.05 µm Water-Free Colloidal Silica 
Date: 07/2021, v1.1 
Refer to the SDS document for 
additional safety information. 
 
Water-free colloidal silica (#180-22010) is ideal as a 
final polishing solution for water-sensitive materials. 
The replacement of water with a glycol base inhibits 
oxidation of water-sensitive materials during the final 
polishing step (Figure 1), including extended 
polishing times for EBSD. Water-free colloidal silica 
should be stored at room temperature. 
 
This final polishing solution provides an excellent surface finish on many water-sensitive 
materials, including, but not limited to, those listed in Table 1. It is also important to utilize 
polishing cloths engineered to withstand prolonged exposure to the chemical composition and 
high pH level of this solution, such as Chem-Pol, Final A and Final P. 
Since the abrasive can crystalize, do not let the cloth dry out. It is recommended to charge the 
cloth with sufficient water-free colloidal silica prior to polishing to prime and saturate the cloth 
with suspension so as not to polish dry. The most common dispensing parameters for 
water-free colloidal silica are 1-second-long pulses at 10 pulses per minute. 
Clean the samples before and after polishing by soaking or rinsing them in isopropyl alcohol, 
and drying them with heat or clean air. This removes debris and abrasive particulates, and 
reduces the likelihood of scratches on samples due to abrasive contamination. After use, clean 
the cloth with sufficient water to remove the solution before storage to prolong cloth life. 
Table 1: Water-Free Colloidal Silica Suspension Uses 
Group 
Material Examples 
Recommended Cloths 
Non-Metallic Materials 
Ceramics, Crystals, Minerals, Polymers 
Chem-Pol, Final A or Final P 
Metallic Materials 
Zinc Coatings, Powder Metals, Some Base Metals 
Chem-Pol, Final P 
 
GHS08 
Figure 1: Zinc coating prepared with (a) water-free colloidal silica suspension and 
(b) standard colloidal silica suspension 
a 
b 

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