
Ceramic & Precious Materials
Grish provide powders and polishing slurry for Hard Ceramic, Sealing ring and Gemstone
OUR STRENGTHS
What Grish Can Do
One-stop Polishing Solutions
GRISH can not only provide you ultra-fine polishing abrasives, we also provide polishing accessories, such as polishing pad, solid wax and dewax liquid which can make your supply chain easier.
Higher Removal Rate
With uniform spherical abrasive particles, our polishing slurries are in a high removal rate and stable polishing performance, achieving Ra<0.1nm and TTV<3um.
Cost-effective Process
With an area of more than 12,000m² factory base and reliable manufacture teams, you can be assured of the stability and consistency of our products and our polishing slurries are recyclable.
SCHEMATIC DIAGRAM
How To Polish Ceramic & Precious Materials
Ceramic & Precious Materials are widely used in many industries, and the polishing process is critical in the manufacture. Grish polishing powder and slurry are specially developed for polishing of Ceramic & Precious Materials. It features high removal rate better surface flatness(Ra, TTV, LTV), high qualification rate,which can effectively reduce the cost while improving the polishing effect.
Ceramic & Precious Materials
Ceramic Polish Process
Grinding process generally including Double Side Lapping (30-60mins) and Ultra-fine Polishing (120mins). In less than 2.5 hours, and you are expected to get a Ra at 10-15nm.
Double Side Lapping
(30-60mins)
Cleaning
Ultra-fine Polishing (120mins)
AlN / SiN Heat Dissipation Substrate Polishing Solution
| AlN / SiN Heat Dissipation Substrate Polishing Solution | Steps | Grish Product |
| Double-sided Lapping (30-60mins) | Rough Polishing Liquid | |
| Ultrafine Polishing(240-480mins) | Nano Diamond Ultrafine Polish Liquid +Polish Pad | |
| CMP Slurry + Quartz Plate |
Grish polishing for AlN / SiN Heat Dissipation Substrate, which uses special Rough and Ultrafine Polish Liquid. Through rough and ultrafine polishing processes, the lapping time is greatly reduced, meantime the quality of the finish is improved, which helps clients enhance the work efficiency.
Grish can help customers to process the substrate upon the requirements, and provide comprehensive solutions in polishing and grinding.
| AlN / SiN Heat Dissipation Substrate Polishing Solution | Steps | Grish Product |
| Double-sided Lapping (30-60mins) | Rough Polishing Liquid | |
| Ultrafine Polishing(240-480mins) | Nano Diamond Ultrafine Polish Liquid +Polish Pad | |
| CMP Slurry + Quartz Plate |
Explore More In The Video
-
Polishing Solution for Semiconductors