高効率CMPスラリー
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迅速で安全な物流
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Take a Closer Look
The acidic pH value is stable, maintaininga high and stable polishing rate.
Combines rough and fine polishing into a single process, greatly reducing process-ing costs and improving processingefficiency.
Test data
Microscope Photo
Semi-insulated 500X
Conductive 500X
Test Conditions and Parameter Settings
- Polishing object: 6-inch SiC substrate*3 pcs*2 Head
- Polishing pad: Suba 600
- Polishing slurry: SC-O80K (Grish)
- Pasting method: wax paste
- Pressure: 120Kg (220g/cm²)
- Speed: lower 66rpm, upper 60rpm
- Circulation barrel: 10L
- Chiller temperature: 20℃
- Polishing time: 4H
Conclusion
The total time of traditional rough polishing and fine polishing is 6-9 hours, and high-efficiency CMP can be used for 2-3 hours to meet polishing requirements.
After polishing with high-efficiency CMP, the Ra values that can be achieved on the carbon and silicon surfaces of silicon carbide are: Si: 0.115nm C: 0.127nm.
仕様
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仕様
パラメータ 内容 テスト機器 粒子サイズ (nm) 70-90 レーザ粒子分析器 粒子の外観 球状 SEM/TEM pH 3-4 pHメーター 粘度 (cst) 粘度計 濃度 (%) 5-10% 比重計 パッケージ 25kg/5kg - 注意: カスタマイズはリクエストに応じて利用可能です。 - -
アプリケーション
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LED & 半導体
Grish provide polishing products for LED & 半導体 polishing. We offer both wet and dry polishing suspensions, as well as oil-based and water-based formulations.
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光学ガラス & Crystal
We offer a wide range of polishing products for optics, glass, and gemstones industries.
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セラミック & 貴金属
Grish provide powders and polishing slurry for Hard Ceramic, Sealing ring and Gemstone
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3C
With the rise of mobile electronic devices, major manufacturers have put forward higher requirements for the surface processing.
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