Polishing Slurry
Semiconductor Polishing Slurry
GRISH has corresponding polishing processes and consumables for compound semiconductors, including SiC(silicon carbide), AlN(aluminum nitride), GaN(gallium nitride), GaAs(gallium arsenide), InP(indium phosphide), etc.
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Fast and safe logistics
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Excellent Finish
The workpiece will be flat and smooth, without obvious defects.
Higher Removal Rate
The micro powder has special morphology and chemical mechanical polishing effect to get a fast removal rate.
Specifications
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Specifications
Parameters Spec. Inspection Method Particle (nm) 200-500 Laser Particle Analyzer Particle Microstructure Spherical SEM pH Value 9~13 pH meter Viscosity (cst) ＜20 Viscometer Concentration (%) 10-30% --- -
Downloads
Semiconductor Polishing Slurry Download
